Interactions of the SiHxCly Silicon Species with the Si4H9 Cluster

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Title:Interactions of the SiHxCly Silicon Species with the Si4H9 Cluster
Creators:
Burda, Jaroslav
Bureš, Michal
Černý, Čestmír
Journal or Publication Title:
Collection of Czechoslovak Chemical Communications, 57, 2, pp. 248-254

Abstract

The CNDO/2 method was applied to the investigation of the surface reaction occurring during the epitaxial growth of silicon single crystals. The aim of the work was to find silicon species from which the crystal growth is possible under the reaction conditions chosen to comply with the application of the CVD technological method. Calculations suggest that the SiH<sub>2</sub>, SiHCl and SiH<sub>3</sub> species are feasible for the further growth.

Title:Interactions of the SiHxCly Silicon Species with the Si4H9 Cluster
Creators:
Burda, Jaroslav
Bureš, Michal
Černý, Čestmír
Divisions:Life and Chemical Sciences > Institute of Organic Chemistry and Biochemistry > Collection of Czechoslovak Chemical Communications
Journal or Publication Title:Collection of Czechoslovak Chemical Communications
Volume:57
Number:2
Page Range:pp. 248-254
ISSN:0010-0765
E-ISSN:1212-6950
Publisher:Institute of Organic Chemistry and Biochemistry
Related URLs:
URLURL Type
http://dx.doi.org/10.1135/cccc19920248UNSPECIFIED
ID Code:26
Item Type:Article
Deposited On:06 Feb 2009 16:36
Last Modified:06 Feb 2009 15:36

Citation

Burda, Jaroslav; Bureš, Michal; Černý, Čestmír (1992) Interactions of the SiHxCly Silicon Species with the Si4H9 Cluster. Collection of Czechoslovak Chemical Communications, 57 (2). pp. 248-254. ISSN 0010-0765

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