Adsorption and Thermal Decomposition of Tetrakis(dimethylamido)titanium on Si and SiO2/Si Surfaces: an XPS Study

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Title:Adsorption and Thermal Decomposition of Tetrakis(dimethylamido)titanium on Si and SiO2/Si Surfaces: an XPS Study
Creators:
Janovská, Michaela
Bastl, Zdeněk
Journal or Publication Title:
Collection of Czechoslovak Chemical Communications, 60, 3, pp. 372-382

Abstract

<p>X-Ray photoelectron spectroscopy (XPS) has been used to study adsorption of tetrakis(dimethylamido)titanium (TDMT) on a clean Si surface and surface on which an oxide layer was grown prior to TDMT adsorption. Measurements were carried out at temperatures 80 and 295 K. In addition, decomposition of TDMT on the above substrates yielding titanium nitride coatings was investigated. The change in surface composition as a function of TiN<i><sub>x</sub></i> layer thickness was monitored by XPS. Adsorption at 80 K proceeds without dissociation on both substrates. Photoelectron spectra measured at 295 K indicate presence of surface species containing C-N multiple bond on both substrates and on SiO<sub>2</sub>/Si substrate formation of species that contain Ti-N-C rings. At 580 K an overlayer consisting predominantly of TiN<i><sub>x</i></sub> was produced by pyrolysis of TDMT. The photoelectron spectra revealed also presence of species with C-N-C, Si-CH<i><sub>x</sub></i> and Ti-C bonds the concentration of which depended on an overlayer thickness. On SiO<sub>2</sub>/Si substrate decomposition of SiO<sub>2 </sub>accompanied by titanium oxide formation occurs during initial stages of TDMT pyrolysis.

Title:Adsorption and Thermal Decomposition of Tetrakis(dimethylamido)titanium on Si and SiO2/Si Surfaces: an XPS Study
Creators:
Janovská, Michaela
Bastl, Zdeněk
Divisions:Life and Chemical Sciences > Institute of Organic Chemistry and Biochemistry > Collection of Czechoslovak Chemical Communications
Journal or Publication Title:Collection of Czechoslovak Chemical Communications
Volume:60
Number:3
Page Range:pp. 372-382
ISSN:0010-0765
E-ISSN:1212-6950
Publisher:Institute of Organic Chemistry and Biochemistry
Related URLs:
URLURL Type
http://dx.doi.org/10.1135/cccc19950372UNSPECIFIED
ID Code:722
Item Type:Article
Deposited On:06 Feb 2009 17:03
Last Modified:06 Feb 2009 16:03

Citation

Janovská, Michaela; Bastl, Zdeněk (1995) Adsorption and Thermal Decomposition of Tetrakis(dimethylamido)titanium on Si and SiO2/Si Surfaces: an XPS Study. Collection of Czechoslovak Chemical Communications, 60 (3). pp. 372-382. ISSN 0010-0765

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